G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes StdTpc-FPD Polarizing Films SEMI E6 — Facilities Interface

SEMI E6 — Facilities Interface Specifications Guideline and Format

2-0923 (technical revision)

repeatability

• Oxygen (O2)

4，SEMI M6

G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes StdTpc-FPD Polarizing Films SEMI E6 — Facilities InterfaceContamination on leadframes can contribute to semiconductor device reliability problems. This Test Method may be used by lead frame manufacturers at outgoing inspection and by users at incoming inspection. Correlation of device reliability with contamination levels may lead to improved leadframe cleaning processes. This Standard describes the procedure to determine ionic contamination on leadframes using a water extraction method. The method is