E06800 - SEMI E68 - Test Method for Determining Warm-Up Time of Mass Flow Controllers StdPbc-0825 which is used in the

which is used in the semiconductor industry for the deposition of tantalum nitride based layers by atomic layer deposition

1 — Specification for SECS-II Support for Processing Management

SEMI E94-1106 (technical revision)

SEMI 3D11-1214 (first published)

This Specification defines equipment metadata based on SEMI E125-0710 and SEMI E120-0310

E06800 - SEMI E68 - Test Method for Determining Warm-Up Time of Mass Flow Controllers StdPbc-0825 which is used in theNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. The purpose of this method is to provide a standardized method for quantifying the warm up time of a mass flow controller (MFC). The test conditions in this method are intended to simulate bench top warm up, with an MFC